NANO 2297

Thin Films Deposition

Prereq: VACT 2293, or NANO 2293

Thin film deposition refers to techniques used to deposit layers of material on a surface ranging in layer thickness of a few nanometers (1 x 10-9 m) up to a thickness of 1 micrometer (1x10-6 m). This course provides an overview of the methods and the embedded vacuum-based technologies used to realize various material deposition processes. Students set up and run processes such as vacuum evaporation and sputtering to create a thin film and then examine characteristics of the layer produced. (Same as VACT 2297.)

Credits: 3
Semesters: Spring

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